![Resist Characteristics of Acryl Polymer with Methyl Acetal Protecting Group for 193nm Lithography]()
Resist Characteristics of Acryl Polymer with Methyl Acetal Protecting Group for 193nm LithographyShirai, Masamitsu; Matsumaru, Shogo; Takahashi, Ryusaku; Kasai, Kohei; Kinoshita, Yohei; Hada, Hideo; Shirai, Masamitsu · Journal of Photopolymer Science and Technology · 2005