SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometerMoon, Songbae; Hosono, Kunihiro; Kim, Seong-Yoon; Bang, Gyung-Yoon; Kim, Byung-Gook; Woo, Sang-Gyun; Cho, Han-ku · 2009

[IEEE 2009 International Conference on the Current Trends in Information Technology (CTIT) - Dubai, United Arab Emirates (2009.12.15-2009.12.16)] 2009 International Conference on the Current Trends in Information Technology (CTIT) - A new method for measuring Auto-Fluorescence changes in neovascular-AMD after intravitreal injection of BavecizumabNorouzifard, Mohammad; Soleymani, Ali; Shanbehzadeh, Jamshid · 2009