Nickel Oxide Thin Film Resistors for Low Pressure Shock Wave Detection
- 期刊名称Review of Scientific Instruments
- 作者McCulloh, K. E.
- 卷第31卷
- 期第7期
- 印刷ISSN0034-6748
- 文件大小410.42KB
- 发表时间1960
- DOI10.1063/1.1717048
A skin sensitization risk assessment approach for evaluation of new ingredients and products.Gerberick, G F; Robinson, M K · American journal of contact dermatitis : official journal of the American Contact Dermatitis Society · 2000
Cocamidopropyl betaine allergyMowad, C · American Journal of Contact Dermatitis · 2001
Eczema and ceramides: an updateJungersted, Jakob Mutanu; Agner, Tove · Contact Dermatitis · 2013
PhytophotodermatitisBOWERS, A · American Journal of Contact Dermatitis · 1999
Chemical leukoderma: Fact or fancyCUMMINGS, M · American Journal of Contact Dermatitis · 1995
Cosmetic industryBARKER, M · American Journal of Contact Dermatitis · 1996
ACDS newsSun, He; Jiang, Tao; Wang, Shubao; He, Bing; Zhang, Yongyan; Piao, Dongxu; Yu, Chong; Wu, Na; Han, Ping · American Journal of Contact Dermatitis · 1999
AnnouncementNorthridge, DavidB.; Alabaster, ColinT.; Connell, JohnM.C.; Dilly, StephenG.; Lever, AnthonyF.; Jardine, AlanG.; Barclay, PaulL.; Dargie, HenryJ.; Findlay, IainN.; Samuels, GillianM.R. · American Journal of Contact Dermatitis · 1999