The Retardation of Gallium Diffusion in Silicon
- 期刊名称Japanese Journal of Applied Physics
- 作者Okamura, Masahiro; Ogawa, Takuzo
- 卷第4卷
- 期第10期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小112.18KB
- 发表时间1965-10
- DOI10.1143/jjap.4.823
- 页码823-824
同期刊推荐
Computers and Dance: A BibliographyGeorge Politis · Leonardo · 1990
Chromatic versus Polychrome SculptureMortimer Borne · Leonardo · 1971
Concerning Sculpture and ArchitectureArt Brenner · Leonardo · 1971
Music and Astronomy in the Muslim WorldJozef Pacholczyk · Leonardo · 1996
Art, Design and Gestalt TheoryRoy R. Behrens · Leonardo · 1998
The Word: Voice, Language and TechnologyCollins, Nicolas · Leonardo Music Journal · 2005
Language Master: Its Master's VoiceOsborn, Ed · Leonardo Music Journal · 2005
Streamlining and American Industrial DesignDonald J. Bush · Leonardo · 1974