The combination of two growth methods for the epitaxial deposition of silicon films on insulating substrates
- 作者M. Druminski; H. Schlötterer
- 卷第17卷
- 印刷ISSN0022-0248
- 文件大小431.36KB
- 发表时间1972
- DOI10.1016/0022-0248(72)90254-0
- 页码249-253
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