Effect of nitrogen on the electrical and structural properties of triode-sputtered tantalum films
- 期刊名称Journal of Applied Physics
- 作者Willmott, David J.
- 卷第43卷
- 期第12期
- 印刷ISSN0021-8979
- 文件大小716.68KB
- 发表时间1972
- DOI10.1063/1.1661039
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