Diffusion of arsenic along dislocations in epitaxial silicon films
- 作者David R. Campbell; K.N. Tu; Robert O. Schwenker
- 卷第25卷
- 期第1期
- 印刷ISSN0040-6090
- 文件大小398.62KB
- 发表时间1975
- DOI10.1016/0040-6090(75)90257-6
- 页码213-220
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