Stress in thermal SiO2 during growth
- 期刊名称Applied Physics Letters
- 作者EerNisse, E. P.
- 卷第35卷
- 期第1期
- 印刷ISSN0003-6951
- 文件大小386.05KB
- 发表时间1979
- DOI10.1063/1.90905
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