Furnace annealing behavior of phosphorus implanted, laser annealed silicon
- 期刊名称Journal of Applied Physics
- 作者Miyao, Masanobu; Itoh, Kazuo; Tamura, Masao; Tamura, Hiroshi; Tokuyama, Takashi
- 卷第51卷
- 期第8期
- 印刷ISSN0021-8979
- 文件大小640.50KB
- 发表时间1980
- DOI10.1063/1.328233
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