Single Crystalline Silicide Formation
- 期刊名称Japanese Journal of Applied Physics
- 作者Saitoh, Shuichi; Ishiwara, Hiroshi; Asano, Tanemasa; Furukawa, Seijiro
- 卷第20卷
- 期第9期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小180.17KB
- 发表时间1981-9
- DOI10.1143/JJAP.20.1649
- 页码1649-1656
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