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Quantifying delineation errors in thin film resistors II: Evaluation of etching rates from resistance measurements

Quantifying delineation errors in thin film resistors II: Evaluation of etching rates from resistance measurements

A. Peled; R. Peled
  • 作者A. Peled; R. Peled
  • 卷第106卷
  • 期第3期
  • 印刷ISSN0040-6090
  • 文件大小187.79KB
  • 发表时间1983
  • DOI10.1016/0040-6090(83)90477-7
  • 页码159-162
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