Laser recrystallization of silicon stripes in SiO2 grooves with a polycrystalline silicon sublayer
- 期刊名称Applied Physics Letters
- 作者Egami, Koji
- 卷第43卷
- 期第11期
- 印刷ISSN0003-6951
- 文件大小488.42KB
- 发表时间1983
- DOI10.1063/1.94215
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