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[IRE 1983 International Electron Devices Meeting - ()] 1983 International Electron Devices Meeting - 3-Dimensional SOI/CMOS IC's fabricated by beam recrystallization

[IRE 1983 International Electron Devices Meeting - ()] 1983 International Electron Devices Meeting - 3-Dimensional SOI/CMOS IC's fabricated by beam recrystallization

Kawamura, S.; Sasaki, N.; Iwai, T.; Mukai, R.; Nakano, M.; Takagi, M.

作者Kawamura, S.; Sasaki, N.; Iwai, T.; Mukai, R.; Nakano, M.; Takagi, M.
文件大小489.07KB
发表时间1983
DOI10.1109/iedm.1983.190517
页码364-367

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