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Submicron patterns in substituted polystyrene resists by focused-ion-beam lithography

Submicron patterns in substituted polystyrene resists by focused-ion-beam lithography

R. G. Brault; R. L. Kubena; J. E. Jensen
  • 作者R. G. Brault; R. L. Kubena; J. E. Jensen
  • 卷第23卷
  • 期第17期
  • 印刷ISSN0032-3888
  • 电子ISSN1548-2634
  • 文件大小646.70KB
  • 发表时间1983
  • DOI10.1002/pen.760231705
  • 页码941-946
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