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ChemInform Abstract: EFFECT OF BACK-SIDE OXIDATION ON BORON AND PHOSPHORUS DIFFUSION IN SILICON DIRECTLY MASKED WITH SILICON NITRIDE (SI3N4) FILMS

ChemInform Abstract: EFFECT OF BACK-SIDE OXIDATION ON BORON AND PHOSPHORUS DIFFUSION IN SILICON DIRECTLY MASKED WITH SILICON NITRIDE (SI3N4) FILMS

MIZUO, S.; HIGUCHI, H.

期刊名称Chemischer Informationsdienst
作者MIZUO, S.; HIGUCHI, H.
卷第14卷
期第6期
印刷ISSN0009-2975
文件大小138.28KB
发表时间1983-02-08
DOI10.1002/chin.198306010

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