Excimer laser enhanced nitridation of silicon substrates
Sugii, Toshihiro; Ito, Takashi; Ishikawa, Hajime
- 期刊名称Applied Physics Letters
- 作者Sugii, Toshihiro; Ito, Takashi; Ishikawa, Hajime
- 卷第45卷
- 期第9期
- 印刷ISSN0003-6951
- 文件大小395.45KB
- 发表时间1984
- DOI10.1063/1.95466