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TiSi[sub 2]∕n[sup +]Poly-Si Gate Electrode Patterning by Plasma Etching Using CF[sub 2]Cl[sub 2]O[sub 2]

TiSi[sub 2]∕n[sup +]Poly-Si Gate Electrode Patterning by Plasma Etching Using CF[sub 2]Cl[sub 2]O[sub 2]

Yachi, Toshiaki

期刊名称Journal of The Electrochemical Society
作者Yachi, Toshiaki
卷第131卷
期第5期
印刷ISSN0013-4651
文件大小235.78KB
发表时间1984
DOI10.1149/1.2115783

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