Conformal Step Coverage of Electron Beam-Assisted CVD of SiO[sub 2] and Si[sub 3]N[sub 4] Films
- 期刊名称Journal of The Electrochemical Society
- 作者Thompson, L. R.
- 卷第131卷
- 期第2期
- 印刷ISSN0013-4651
- 文件大小646.45KB
- 发表时间1984
- DOI10.1149/1.2115608
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