Electron distributions for thin Ni Film−MgF2 interfaces by electron induced X-ray emission
- 作者B. Iraqi; F. Vergand; D. Fargues; C. Bonnelle
- 卷第162卷
- 印刷ISSN0167-2584
- 文件大小50.00KB
- 发表时间1985
- DOI10.1016/0167-2584(85)90348-2
同作者推荐
Photoelectron study of planar alumina growth on polycrystalline aluminumA. Fritsch; P. Légaré · 1987
Photoelectron study of planar alumina growth on polycrystalline aluminumA. Fritsch; P. Légaré · 1987
Photoelectron study of planar alumina growth on polycrystalline aluminumA. Fritsch; P. Légaré · 1987
XPS study of the Pt/Al2O3 interfaceA. Fritsch; P. Légaré · 1987
SPS study of the Pt/Al2O3 interfaceA. Fritsch; P. Légaré · 1987
XPS study of transition metal/alumina model catalysts: Equilibrium and energy referencingP. Légaré; A. Fritsch · 1990
XPS study of small iridium clusters; Comparison with the Ir4 (CO)12 moleculeA. Fritsch; P. Légaré · 1984