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Boron Doping Effects in Lateral Solid Phase Epitaxy of Amorphous Si Films

Boron Doping Effects in Lateral Solid Phase Epitaxy of Amorphous Si Films

Ishiwara, Hiroshi; Tamba, Akihiro; Yamamoto, Hiroshi; Furukawa, Seijiro

期刊名称Japanese Journal of Applied Physics
作者Ishiwara, Hiroshi; Tamba, Akihiro; Yamamoto, Hiroshi; Furukawa, Seijiro
卷第24卷
印刷ISSN0021-4922
文件大小450.08KB
发表时间1985-7-20
DOI10.1143/JJAP.24.L513

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