SPIE Proceedings [SPIE 1985 Microlithography Conferences - Santa Clara (Monday 11 March 1985)] Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV - Submicron Pattern Fabrication By Focused Ion Beams
- 作者Kato, T.; Morimoto, H.; Nakata, H.; Blais, Phillip D.
- 卷第537卷
- 印刷ISSN0277-786X
- 文件大小6875.04KB
- 发表时间1985
- DOI10.1117/12.947501
- 页码188-197
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