SPIE Proceedings [SPIE 1985 Los Angeles Technical Symposium - Los Angeles (Monday 21 January 1985)] Advanced Applications of Ion Implantation - MeV Implantation In Semiconductors
Cheung, Nathan W.; Current, Michael I.; Sadana, Devindra K.
- 作者Cheung, Nathan W.; Current, Michael I.; Sadana, Devindra K.
- 卷第530卷
- 印刷ISSN0277-786X
- 文件大小2327.30KB
- 发表时间1985
- DOI10.1117/12.946460
- 页码2-8