The influence of substrate temperature and sputtering gas atmosphere on the electrical properties of reactively sputtered indium tin oxide films
- 作者Shozaburo Nishikawa
- 卷第135卷
- 期第2期
- 印刷ISSN0040-6090
- 文件大小528.40KB
- 发表时间1986
- DOI10.1016/0040-6090(86)90129-x
- 页码219-228