Morphology of hydrogenated amorphous silicon films by photochemical vapor deposition
- 期刊名称Applied Physics Letters
- 作者Mutsukura, Nobuki; Machi, Yoshio
- 卷第48卷
- 期第8期
- 印刷ISSN0003-6951
- 文件大小439.47KB
- 发表时间1986
- DOI10.1063/1.96501
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