Correlation Between Breakdown and Process-Induced Positive Charge Trapping in Thin Thermal SiO[sub 2]
- 期刊名称Journal of The Electrochemical Society
- 作者Holland, S.
- 卷第133卷
- 期第8期
- 印刷ISSN0013-4651
- 文件大小1118.58KB
- 发表时间1986
- DOI10.1149/1.2108999
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