A negative resist, LMR (low molecular weight resist), for deep UV lithography
- 作者Toshio Itoh; Yoshio Yamashita; Ryuji Kawazu; Kazutami Kawamura; Seigo Ohno; Takateru Asano; Kenji Kobayashi; Gentaro Nagamatsu
- 卷第26卷
- 期第16期
- 印刷ISSN0032-3888
- 电子ISSN1548-2634
- 文件大小1206.50KB
- 发表时间1986
- DOI10.1002/pen.760261606
- 页码1105-1111