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Self-Interstitial Migration in Si Implanted with Oxygen

Self-Interstitial Migration in Si Implanted with Oxygen

J. Stoemenos; J. Margail; M. Dupuy; C. Jaussaud

作者J. Stoemenos; J. Margail; M. Dupuy; C. Jaussaud
文件大小562.73KB
发表时间1987
DOI10.1088/0031-8949/35/1/009

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