SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Optical Microlithography VI - Exposure Matching Of Polychromatic Exposure Systems
- 作者Keese, William A.; Stover, Harry L.
- 卷第772卷
- 印刷ISSN0277-786X
- 文件大小325.30KB
- 发表时间1987
- DOI10.1117/12.967047
- 页码174-179