SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - New PCM (HR-PCM) Technique Using Novolak-Diazide Type Photoresist As A Bottom Layer
Yamashita, Yoshio; Jinbo, Hideyuki; Kawazu, Ryuji; Ohno, Seigo; Asano, Takateru; Kobayashi, Kenji; Nagamatsu, Gentaro; Bowden, Murrae J.
- 作者Yamashita, Yoshio; Jinbo, Hideyuki; Kawazu, Ryuji; Ohno, Seigo; Asano, Takateru; Kobayashi, Kenji; Nagamatsu, Gentaro; Bowden, Murrae J.
- 卷第771卷
- 印刷ISSN0277-786X
- 文件大小6458.70KB
- 发表时间1987
- DOI10.1117/12.940334
- 页码273-280