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Relativistic laminar space-charge flow in axially symmetric systems†MASNARI, N. A. · International Journal of Electronics · 1968

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Multistep, In-Situ Single Wafer Processing - Materials, Device and Equipment IssuesHauser, J. R.; Masnari, N. A.; Littlejohn, M. A. · MRS Proceedings · 1989

Sub-Half Micron Elevated SourceDrain NMOSFETS by Low Temperature Selective Epitaxial DepositionSun, J.; Bartholomew, R. F.; Bellur, K.; O'Neil, P. A.; Srivastava, A.; Violette, K. E.; Oztiirk, M. C.; Osburn, C. M.; Masnari, N. A. · MRS Proceedings · 1996

Revised derivation of Landau dampingALEXEFF, IGOR; RADER, MARK · International Journal of Electronics · 1990

Editorial BoardAEU - International Journal of Electronics and Communications · 2012

Editorial BoardAEU - International Journal of Electronics and Communications · 2012

Editorial BoardAEU - International Journal of Electronics and Communications · 2013

Editorial BoardAEU - International Journal of Electronics and Communications · 2013

Doppler shift dominated cyclotron masersLIN, A. T. · International Journal of Electronics · 1984

Ohmic contacts to InPMILLS, H. T.; HARTNAGEL‡, H. L. · International Journal of Electronics · 1979

Microstrip discontinuitiesGARG, RAMESH; BAHL, I. J. · International Journal of Electronics · 1978