Ammonium Hexafluorosilicate Formation during Plasma Etching of Silicon Nitride
- 期刊名称Journal of The Electrochemical Society
- 作者Knolle, W. R.
- 卷第135卷
- 期第10期
- 印刷ISSN0013-4651
- 文件大小600.69KB
- 发表时间1988
- DOI10.1149/1.2095383
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