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Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2by SNMS, XPS, TDS and TRFA

Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2by SNMS, XPS, TDS and TRFA

K. -H. Müller; V. Rupertus; H. Oechsner; V. Scheuer; T. Tschudi

作者K. -H. Müller; V. Rupertus; H. Oechsner; V. Scheuer; T. Tschudi
卷第333卷
印刷ISSN1618-2642
电子ISSN1618-2650
文件大小369.57KB
发表时间1989
DOI10.1007/bf00572362
页码498-501

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