Silicon surface passivation by hydrogen termination: A comparative study of preparation methods
Fenner, D. B.; Biegelsen, D. K.; Bringans, R. D.
- 期刊名称Journal of Applied Physics
- 作者Fenner, D. B.; Biegelsen, D. K.; Bringans, R. D.
- 卷第66卷
- 期第1期
- 印刷ISSN0021-8979
- 文件大小1129.15KB
- 发表时间1989
- DOI10.1063/1.343839