An electron spectroscopy study of the growth and thermally activated diffusion of nickel thin films on Al(111) and Al2O3/Al(111): J E Crowell et al, Thin Solid Films, 153, 1987, 341–347

• 卷第39卷
• 期第5期
• 印刷ISSN0042-207X
• 文件大小153.36KB
• 发表时间1989
• DOI10.1016/0042-207x(89)90622-2