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[IEEE Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Santa Clara, CA, USA (12-13 June 1989)] Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Deposited oxides for high integrity applications

[IEEE Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Santa Clara, CA, USA (12-13 June 1989)] Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Deposited oxides for high integrity applications

Freeman, D.W.; Monowski, J.R.; Ruggles, G.A.

作者Freeman, D.W.; Monowski, J.R.; Ruggles, G.A.
文件大小87.74KB
发表时间1989
DOI10.1109/vmic.1989.78056

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