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Interface atomic structure of Si/SiO2/Si formed by molecular beam deposition

Interface atomic structure of Si/SiO2/Si formed by molecular beam deposition

Sakai, Akira; Tatsumi, Toru; Niino, Taeko; Hirayama, Hiroyuki; Ishida, Koichi

期刊名称Applied Physics Letters
作者Sakai, Akira; Tatsumi, Toru; Niino, Taeko; Hirayama, Hiroyuki; Ishida, Koichi
卷第55卷
期第24期
印刷ISSN0003-6951
文件大小635.79KB
发表时间1989
DOI10.1063/1.102298

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