Ion Mass Effects on the Plasma Etching Characteristics of Si and SiO[sub 2]
- 期刊名称Journal of The Electrochemical Society
- 作者Cooke, M. J.
- 卷第136卷
- 期第6期
- 印刷ISSN0013-4651
- 文件大小281.71KB
- 发表时间1989
- DOI10.1149/1.2097027
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