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Etching of silicon and silicon dioxide by halofluorocarbon plasmas

Etching of silicon and silicon dioxide by halofluorocarbon plasmas

E. Occhiello; F. Garbassi; J. W. Coburn
  • 作者E. Occhiello; F. Garbassi; J. W. Coburn
  • 文件大小553.78KB
  • 发表时间1989
  • DOI10.1088/0022-3727/22/7/018
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