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Interfacial factors that affect the photoefficiency of semiconductor-sensitized oxidations in nonaqueous media

Interfacial factors that affect the photoefficiency of semiconductor-sensitized oxidations in nonaqueous media

Becker, W. G.; Truong, M. M.; Ai, C. C.; Hamel, N. N.

期刊名称The Journal of Physical Chemistry
作者Becker, W. G.; Truong, M. M.; Ai, C. C.; Hamel, N. N.
卷第93卷
期第12期
印刷ISSN0022-3654
电子ISSN1541-5740
文件大小1047.08KB
发表时间1989-06
DOI10.1021/j100349a040
页码4882-4886

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