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Formation of Palladium Silicide and Germanide in the Pd/a-Si/Si., Pd/a-Ge/Si, and Pd/a-GeSi/Si Systems During Thermal Treatment

Formation of Palladium Silicide and Germanide in the Pd/a-Si/Si., Pd/a-Ge/Si, and Pd/a-GeSi/Si Systems During Thermal Treatment

Edelman, F.; Cytermann, C.; Brener, R.; Eizenberg, M.; Weil, R.; Beyer, W.
  • 期刊名称MRS Proceedings
  • 作者Edelman, F.; Cytermann, C.; Brener, R.; Eizenberg, M.; Weil, R.; Beyer, W.
  • 卷第205卷
  • 电子ISSN1946-4274
  • 文件大小1381.64KB
  • 发表时间1990-1
  • DOI10.1557/proc-205-281
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