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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - <title>New indexes of the 0.5-μm resolution resist for optical lithography</title>

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - New indexes of the 0.5-μm resolution resist for optical lithography

Sugimoto, Aritoshi; Ito, Tetsuo; Okano, Sadao; Nozaki, Masahiro; Kato, Takeshi; Suko, Kazuyuki; Tsunematsu, Masayasu; Kadota, Kazuya; Pol, Victor
  • 作者Sugimoto, Aritoshi; Ito, Tetsuo; Okano, Sadao; Nozaki, Masahiro; Kato, Takeshi; Suko, Kazuyuki; Tsunematsu, Masayasu; Kadota, Kazuya; Pol, Victor
  • 卷第1264卷
  • 印刷ISSN0277-786X
  • 文件大小339.12KB
  • 发表时间1990
  • DOI10.1117/12.20218
  • 页码413-421
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