SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Environmental effects on registration and accuracy data on quartz photomasks utilizing the LMS-2000 laser metrology system
- 作者Land, Larry E.; Whittey, John M.; Arnold, William H.
- 卷第1261卷
- 印刷ISSN0277-786X
- 文件大小475.05KB
- 发表时间1990
- DOI10.1117/12.20072
- 页码459-469
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