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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - <title>0.5-μm optical mask process for 364-nm scanned laser lithography</title>

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - 0.5-μm optical mask process for 364-nm scanned laser lithography

Buck, Peter D.; Pol, Victor

作者Buck, Peter D.; Pol, Victor
卷第1264卷
印刷ISSN0277-786X
文件大小811.32KB
发表时间1990
DOI10.1117/12.20186
页码158-166

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