Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes

• 作者L. Hiltunen; H. Kattelus; M. Leskelä; M. Mäkelä; L. Niinistö; E. Nykänen; P. Soininen; M. Tiittad
• 卷第28卷
• 期第4期
• 印刷ISSN0254-0584
• 文件大小665.88KB
• 发表时间1991
• DOI10.1016/0254-0584(91)90073-4
• 页码379-388