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Low-Temperature Growth of Thin Films of Al
<sub/>2</sub>
O
<sub/>3</sub>
by Sequential Surface Chemical Reaction of trimethylaluminum and H
<sub/>2</sub>
O
<sub/>2</sub>

Low-Temperature Growth of Thin Films of Al ₂ O ₃ by Sequential Surface Chemical Reaction of trimethylaluminum and H ₂ O ₂

Fan, Jia-Fa; Sugioka, Koji; Toyoda, Koichi

期刊名称Japanese Journal of Applied Physics
作者Fan, Jia-Fa; Sugioka, Koji; Toyoda, Koichi
卷第30卷
印刷ISSN0021-4922
文件大小407.88KB
发表时间1991-6-15
DOI10.1143/JJAP.30.L1139

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