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[IEEE Third International Conference Indium Phosphide and Related Materials - Cardiff, UK (8-11 April 1991)] [Proceedings 1991] Third International Conference Indium Phosphide and Related Materials - Effects of PCl/sub 3/ addition on ECR CH/sub 4//H/sub 2//Ar plasma etching of InP and InGaAs

[IEEE Third International Conference Indium Phosphide and Related Materials - Cardiff, UK (8-11 April 1991)] [Proceedings 1991] Third International Conference Indium Phosphide and Related Materials - Effects of PCl/sub 3/ addition on ECR CH/sub 4//H/sub 2//Ar plasma etching of InP and InGaAs

Pearton, S.J.; Katz, A.; Chakrabarti, U.K.

作者Pearton, S.J.; Katz, A.; Chakrabarti, U.K.
文件大小322.35KB
发表时间1991
DOI10.1109/ICIPRM.1991.147466
页码252-255

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