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Preparation of copper thin films at ambient temperature by microwave plasma-enhanced chemical vapor deposition from the copper (II) acetylacetonate-argon-hydrogen system

Preparation of copper thin films at ambient temperature by microwave plasma-enhanced chemical vapor deposition from the copper (II) acetylacetonate-argon-hydrogen system

Pelletier, J.; Pantel, R.; Oberlin, J. C.; Pauleau, Y.; Gouy-Pailler, P.

期刊名称Journal of Applied Physics
作者Pelletier, J.; Pantel, R.; Oberlin, J. C.; Pauleau, Y.; Gouy-Pailler, P.
卷第70卷
期第7期
印刷ISSN0021-8979
文件大小877.15KB
发表时间1991
DOI10.1063/1.349192

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