Metal-induced dislocation nucleation for metastable SiGe/Si
- 期刊名称Applied Physics Letters
- 作者Higgs, V.; Kightley, P.; Goodhew, P. J.; Augustus, P. D.
- 卷第59卷
- 期第7期
- 印刷ISSN0003-6951
- 文件大小736.36KB
- 发表时间1991
- DOI10.1063/1.105249
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