Variation of Thermal Donors in Diffused Wafers by rapid Thermal Annealing
- 期刊名称MRS Proceedings
- 作者Sugiyama, Takahide; Usami, Akira; Ito, Akira; Natori, Taichi; Tokuda, Yutaka; Wada, Takao
- 卷第224卷
- 电子ISSN1946-4274
- 文件大小336.21KB
- 发表时间1991-1
- DOI10.1557/proc-224-75