Development of OXSIM2D: A Simulation Program of SiO2 Growth and Stress Generation in Thermal Oxidation Process of Silicon.

SAITO, Naoto; SAKATA, Shinji; IKEGAWA, Masahiro; MIURA, Hideo; OHTA, Hiroyuki; SHIMIZU, Tasuku; ISOMAE, Seiichi; MASUDA, Hiroo

期刊名称Transactions of the Japan Society of Mechanical Engineers Series A
作者SAITO, Naoto; SAKATA, Shinji; IKEGAWA, Masahiro; MIURA, Hideo; OHTA, Hiroyuki; SHIMIZU, Tasuku; ISOMAE, Seiichi; MASUDA, Hiroo
卷第57卷
期第541期
印刷ISSN0387-5008
电子ISSN1884-8338
文件大小690.84KB
发表时间1991
DOI10.1299/kikaia.57.2057
页码2057-2062

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